Wednesday, February 15, 2012

TEL joins CEA-Leti’s IMAGINE program to prepare for introduction of EB maskless lithography

TOKYO, JAPAN & GRENOBLE, FRANCE: Tokyo Electron(TEL) and CEA-Leti announced that TEL will join IMAGINE program, which supports the evolution and launch of Electron Beam (EB) high-throughput Maskless Lithography (ML2) technology, developed by MAPPER BV.

“ML2 is a patterning candidate for future semiconductor devices. As a tool supplier, TEL is interested in emerging and promising technologies,” said Toshi Nishigaki, VP and GM of TEL CTBU. “Leti has gained real expertise in ML2 technology. Through our collaboration to Leti’s programs, we expect further progress in next generation patterning solutions.”

“We have been working with TEL on different fields of microelectronics for many years. The TEL interest in joining development programs on ML2 is a strong message to the industry of the coming maturity of this lithography solution for next advanced nodes,” said Serge Tedesco, CEA-Leti program manager. “The experience carried out by TEL, the worldwide leader coater/developer company will be of great value for the development of next generation lithography solutions developed within the frame of the Leti programs.”

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