Friday, May 31, 2013

GLOBALFOUNDRIES accelerates adoption of 20nm-LPM and 14nm-XM FinFET processes

DAC 2013, USA: GLOBALFOUNDRIES will unveil a comprehensive set of certified design flows to support its most advanced manufacturing processes.

The flows, jointly developed with the leading EDA providers, offer robust support for implementing designs in the company’s 20nm low power process and its leading-edge 14nm-XM FinFET process.

Working closely with Cadence Design Systems, Mentor Graphics and Synopsys, GLOBALFOUNDRIES has developed the flows to address the most pressing design challenges, including support for analog/mixed signal (AMS) design, and advanced digital designs, both with demonstration of the impact of double patterning on the flow.

The GLOBALFOUNDRIES design flows work with its process design kits (PDKs) to provide real examples that demonstrate the entire flow. The user can download the design database, the PDK, detailed documentation and multi-vendor scripts to learn how to set up and use the GLOBALFOUNDRIES design flow. The flows use open source examples and provide the customer with working, executable and customizable flows.

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