Tuesday, February 14, 2012

TEL joins CEA-Leti industrial programs IMAGINE and IDEAL

TOKYO, JAPAN & GRENOBLE, FRANCE: TEL and CEA-Leti announced that TEL will join IMAGINE and IDEAL, two open and collaborative industrial programs on lithography launched by CEA-Leti. Through this decision, TEL will be a member and one of the 15 industrial partners of the IMAGINE program which supports the evolution and the launch of the high-throughput Maskless lithography technology developed by MAPPER BV.

CEA-Leti and TEL will also join their efforts and will work closely in the IDEAL program. Launched during the second half of 2011, the objective of this new initiative is to develop 300mm DSA process and material solutions for sub-20 nm nodes and already starts to attract strong industrial interest.

“ML2 and DSA are the candidates of the future regarding patterning of semiconductor devices. As a tool supplier, TEL is paying attention to emerging and promising technologies,” said Toshi Nishigaki, CTBU GM and VP. “Leti has gained a real expertise in EB[3] and DSA. Through our collaboration to Leti’s programs, we expect further progress in next generation patterning solutions.”

“We have been working with TEL on different fields of microelectronics for many years. The TEL interest in joining both development programs on ML2 and DSA is a strong message to the industry of the coming maturity of these lithography solutions for the next advanced nodes,” said Serge Tedesco, CEA-Leti program manager. “The experience carried out by TEL, the worldwide leader track company will be of great value for the development of next generation lithography solutions developed within the frame of the Leti programs.”

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