Thursday, April 5, 2012

Etching workshop stimulates R&D connections between Plasma-Therm and UCLA's California Nanosystems Institute

ST. PETERSBURG, USA: Plasma-Therm, a semiconductor equipment supplier, and the California NanoSystems Institute at the University of California, Los Angeles, co-sponsored a technical workshop focused on advanced plasma processing. Nearly 50 graduate students, post docs, professors, and local engineers with backgrounds in electrical engineering, physics, chemistry, materials, and biosciences attended to learn about applying plasma etching to the fabrication of electronic, photonic, medical, and nanoscale structures.

Presentations progressed from fundamental vacuum science, plasma generation, and etching mechanisms to leading edge etch processes for deep silicon, III-V compound semiconductors, dielectric materials, and metals.

Steve Franz, Nanoelectronics Research Facility manager and former CNSI Cleanroom manager, commented: “There was a wealth of information condensed into a single day
and the speakers did a great job to avoid overloading the audience or sacrificing too much detail. The material was presented in a logical order and generated many very positive comments.”

Dr. David Lishan, Plasma-Therm principal scientist, workshop organizer and one of the instructors, explained: “We see our role as an equipment vendor providing more than technology, equipment and service. These workshops are a setting to demonstrate our commitment to education. Teaching plasma etching fundamentals along with advanced practices allows users to more efficiently develop their fabrication processes. In research and development, understanding and insight are fundamental to progress. The workshop assists those utilizing etching in their research to more rapidly reach their goals and increases Plasma-Therm awareness of current R&D trends.”

No comments:

Post a Comment

Note: Only a member of this blog may post a comment.