AMO decides in favor of Vistec’s electron-beam lithography system EBPG5200

AACHEN, GERMANY & Watervliet, USA: Vistec Lithography, Inc., a leading supplier of advanced electron-beam lithography systems, announced that AMO GmbH, a research service provider for nanotechnology located in Aachen (Germany), has placed an order for Vistec’s electron-beam lithography system EBPG5200.

AMO (Gesellschaft für Angewandte Mikro- und Optoelektronik mbH) as a research service provider holds designated competencies in several areas of nanotechnology as nanofabrication, nanoelectronics, nanophotonics and biotechnology.

Beside R&D capacity, AMO is able to offer the entire infrastructure required for nanotechnology, in which electron-beam lithography plays a decisive role. With the new Vistec EBPG5200 a highly flexible and reliable patterning system will be available for nanofabrication services.

The Vistec EBPG5200 is the latest version of the highly successive and field-proven EBPG electron-beam lithography tool series. The EBPG5200 system can be operated with 20, 50 and 100kV accelerating voltage and is equipped with a 50MHz pattern generator and full 20bit address technology. With the EBPG5200 Vistec offers true 100kV/ 1mm performance under regular electron-optical conditions.

Thanks to further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to routinely generate structures less than 8nm on varying substrates sizes from piece parts of a few millimetres to full patterning across a 200mm diameter. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse “multi user environments”.

Dr. Christian Moormann, MD of AMO GmbH, stated: "High end electron beam lithography is the basic technology for all our activities in nanophotonics, electronics and nanoimprint. We decided to base our flexible nanotechnology R&D services again upon a Vistec electron beam lithography system because performance and service were convincing. We believe in the high quality of EPBG5200 even in rugged environmental situations and enlarge our capabilities significantly with the new system."

Rainer Schmid, GM at Vistec Lithography, noted: “With the EBPG5200 at AMO a long lasting and fruitful collaboration between the two companies further continues. Customers like AMO help us to supply systems, which fit best to the challenging requirements of nanopatterning today and in future.”