Thursday, April 4, 2013

Bruker intros AFM semiconductor characterization solution

USA: Bruker announced the release of the Dimension Icon SSRM-HR, a new atomic force microscope (AFM) configuration including the Scanning Spreading Resistance Microscopy (SSRM) module, designed specifically for high-resolution (HR) semiconductor characterization.

Integrating Bruker’s industry-leading Dimension Icon AFM platform with an environmental control system capable of 1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system provides vastly improved repeatability and spatial resolution in semiconductor carrier profiling. As confirmed by Imec, buried gate oxide layers as thin as 5Å are detected routinely.

Dimension Icon SSRM-HR constitutes a new AFM configuration that integrates the large stage, low drift, and finest force control of the Dimension Icon platform with the Scanning Spreading Resistance Microscopy (SSRM) application module, SSRM-DIA probes, and high-end environmental control.

Following seamless sample transfer from a high vacuum sample preparation chamber, oxygen and water are controlled at the 1ppm level during AFM imaging. The environmental control system is compatible with all released Dimension Icon accessories and application modules, further extending its benefits to additional applications.

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