Mentor Graphics and GLOBALFOUNDRIES extend RET and OPC collaboration to 28nm

WILSONVILLE, USA: Mentor Graphics Corp. and GLOBALFOUNDRIES announced that the companies have extended their collaboration on computational lithography to the 28nm technology node.

Building on a successful deployment at 65nm and 45nm, GLOBALFOUNDRIES will leverage Mentor’s Calibre computational lithography platform to support its advanced mask production needs at 28nm. The announcement underscores the two companies’ commitment to collaboration in order to deliver enablement technology for advanced nodes.

“Mentor continues to distinguish itself through its commitment to partnership in both technology delivery and technical support,” said Mojy Chian, senior VP, Design Enablement at GLOBALFOUNDRIES. “The collaboration between Mentor and GLOBALFOUNDRIES results in high-performance foundry capabilities from design enablement through mask data preparation. It helps us to achieve our aggressive goal of providing world-class foundry services to our customers at advanced process nodes.”

“The Calibre manufacturing platform, including Calibre nmOPC, provides accuracy and speed, together with low cost of ownership,” said Joseph Sawicki, VP and GM of the Design-to-Silicon division of Mentor Graphics. “Our partnership helps ensure that GLOBALFOUNDRIES has the mask manufacturing flow it needs to compete successfully in the foundry market.”