FREMONT, USA: Mattson Technology Inc., a leading supplier of advanced process equipment used to manufacture semiconductors, has released the paradigmE etch system, the company's latest innovation targeted to meet the stringent requirements of advanced dielectric etch applications.
The latest etch system extends Mattson's Nexion(R) etch with state-of-the-art technology features that offer superior on-wafer performance, including excellent control of within-wafer uniformity, profile and critical-dimension.
In addition, the paradigmE's compact and high-productivity platform has demonstrated greater than 50 percent throughput improvement over the competitors, providing enabling technology at low Cost-of-Ownership (CoO).
The company noted that it has received multiple paradigmE orders from a leading memory customer, who has been evaluating the paradigmE system since 2008. It also anticipates the shipment of a paradigmE evaluation system to its fourth etch customer in the current first quarter.
David L. Dutton, president and CEO, noted: "We are extremely pleased to announce the release of the paradigmE. The industry has been demanding a cost effective and technically advanced dielectric etch solution required for leading-edge volume manufacturing. Our unique Faraday-shielded ICP source technology combined with the field-proven, high-productivity platform delivers a clear advantage to our customers seeking advanced etch technology at the lowest cost."
He added: "Expanding into the etch market was a strategic decision for Mattson Technology. Following the footsteps of the Nexion etch success, the paradigmE further solidifies our position to address the growing dielectric etch market segment. The paradigmE etch system covers all dielectric etch applications qualified by Nexion and more, while the overall process and tool performances have met or exceeded all expectations.
"The latest paradigmE orders from our key customer are testament to the traction we are gaining with etch, and we are fully committed to work closely with our customer to continue to support their current as well as anticipated demand for future requirements."