Jordan Valley Semiconductors announces new metrology tool for SiGe, Si:C and strained silicon

MIGDAL HAEMEK, ISRAEL: Jordan Valley Semiconductors Ltd (JVS), a leading provider of X-ray-based semiconductor in-line metrology tools, has launched its new JVX7200, which targets the challenging SiGe in-line process monitoring.

The system is the first ever production-worthy tool to combine HRXRD (High-Resolution X-Ray Diffraction) and XRR (X-Ray Reflectance) technologies for strain, composition, and thickness measurement of SiGe stacks for sub 45 nm technology nodes.

Isaac Mazor, CEO and president of Jordan Valley Semiconductors, said: "SiGe metrology has traditionally been very slow with only a few measurements per hour, which limits fab productivity. The new JVX7200 tool addresses the challenge, solving this process bottleneck with more than an order-of-magnitude throughput improvement, thereby reducing response time to crises."

The JVX7200 tool leapfrogs contemporary in-line SiGe metrologies and combines a fast 2D HRXRD detector for composition and relaxation measurements with an ultra-small spot, fast XRR detector. The tool is compatible with fully automated modern fabs, and features both a small carbon footprint and a low cost of ownership.