Epistar qualifies Veeco’s MaxBright MOCVD system for high volume production

PLAINVIEW, USA: Veeco Instruments Inc. announced that Epistar Corp., headquartered in Taiwan, has recently qualified the TurboDisc MaxBright gallium nitride (GaN) Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System for high-volume production of high brightness light emitting diodes (HB LEDs).

Ming Jiunn Jou, president of Epistar, commented: “Veeco’s MaxBright Multi-Chamber System enables us to ramp production quickly on the industry’s most productive platform. We will continue to rely on Veeco for technological innovation and process expertise as a strong strategic partner. Veeco’s commitment to providing best-in-class MOCVD equipment, as well as enhanced local support with their new technology center in Hsinchu, will help Epistar to achieve our future expansion goals and success.”

William J. Miller, Veeco’s executive VP, LED & Solar, commented: “The MaxBright system is the ideal solution for the lowest cost of ownership LED production, and we are pleased that Epistar, a clear leader in high quality LED manufacturing, has adopted the MaxBright for their production ramp. Our long-standing partnership is a key factor in the mass adoption of LEDs for general lighting.”