WILSONVILLE, USA: Mentor Graphics Corp. has collaborated with GLOBALFOUNDRIES to create a facility called Graphical Design Rule Manual (GDRM) that helps IC designers rapidly debug layout design rule violations by integrating the Calibre RVE results viewing environment with GLOBALFOUNDRIES’ electronic design rule manuals.
With GDRM, designers using the Calibre RVE tool to correct DRC hotspots can automatically access detailed GLOBALFOUNDRIES textual and graphical reference information about the specific rules generating the violations. By providing instant access to relevant information, the solution allows designers to fix errors more quickly and reduce time to signoff.
“The manufacturing variability issues of advanced process nodes has led to an exponential explosion in the complexity of design rules, resulting in longer physical verification debugging cycles,” said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES.
“To counteract this trend, GLOBALFOUNDRIES is investing in unique capabilities aimed at helping GLOBALFOUNDRIES customers get to market more quickly. Our GDRM effort with Mentor is a good example of how our collaboration with ecosystem partners addresses specific bottlenecks and improves the overall design-to-silicon flow.”
“To make it easier for the industry to take advantage of advanced processes such as those being offered by GLOBALFOUNDRIES, we’re striving to make all facets of design enablement more seamless and productive,” said Michael Buehler-Garcia, director of marketing for Calibre design-side products at Mentor Graphics. “Cooperation to make DRC debug a faster and simpler process for custom designers is just one example of Mentor’s and GLOBALFOUNDRIES’ commitment to providing real-world solutions to the foundry ecosystem.”
The Calibre RVE integration with GLOBALFOUNDRIES’ GDRM is being shown in the Mentor booth at the Global Technology Conference on September 1 in Santa Clara, California.
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