BANGALORE, INDIA: Magma Design Automation announced that TowerJazz, the global specialty foundry leader, has qualified the Titan Mixed-Signal Design Platform for TowerJazz’s Power Management Analog/Mixed-Signal (AMS) Reference Flow and process design kits (iPDKs) for its 180-nanometer (nm) technologies.
Magma’s Titan software and TowerJazz’s foundry technology provide mutual customers with a comprehensive design and manufacturing solution that enables users to accelerate the design-to-silicon process and achieve first-time silicon success.
TowerJazz’s Power Management AMS Reference Flow includes a comprehensive design flow and a Band Gap Reference design that demonstrates an effective methodology when taking advantage of TowerJazz’s advanced Power Management process.
With detailed flow steps and tools such as Titan that are qualified for TowerJazz’s 180-nm Power Management process iPDK, the reference flow provides TowerJazz and Magma customers faster turnaround time.
“By working together to provide out-of-the-box flows, and create and qualify iPDKs for the most advanced power management offering, TowerJazz and Magma offer mutual customers a faster, more reliable path from design to volume production,” said Ori Galzur, vice president of Design Center and iPDK Development at TowerJazz.
“Having such a reference flow enables customers to easily design into the complex technologies that TowerJazz develops using automated best-in-class EDA tools.”
"By automating key steps in the design process, Titan enables designers to quickly explore the design space and find the optimal solutions," said Anirudh Devgan, general manager of Magma's Custom Design Business Unit. "The combination of Titan with TowerJazz technology makes it easier for our customers to develop highly differentiated and more profitable mixed-signal systems-on-chip (SoCs).”
TowerJazz 180-nm process and features
TowerJazz’s 180-nm Power Management process is a cost-effective solution, which offers modular add-ons such as a unique zero-mask-adder multi-programmable non-volatile memory (NVM) solution, thick copper-top metallization for high current drive, and optional 1.8V gate for heavy digital power management ICs.
In addition, it offers scalable LDMOS devices that provide excellent area optimization of the power devices for up to 60 volts, all with very low mask count.
Titan: Accelerating analog design
The Titan environment includes the comprehensive Titan Mixed-Signal Design Platform and a set of breakthrough point-tool technologies known as the Titan Accelerators.
The Titan Mixed-Signal Platform is the industry’s first true mixed-signal design platform. It integrates implementation and verification while delivering first-time-correct, predictable mixed-signal designs. The Titan mixed-signal platform includes a schematic editor, a complete analog simulation environment, schematic-drive layout and layout editor.
This platform is tightly integrated with the Talus digital implementation tools and provides a chip finishing flow to deliver a comprehensive mixed-signal design platform.
Titan Accelerators are advanced technology solutions that dramatically improve analog/mixed-signal design productivity and reuse. The Titan Accelerators can be used separately as point tools to augment existing tool flows, or combined to create a comprehensive high-performance analog/mixed-signal design environment.
The family of products includes the Titan Analog Design Accelerator (ADX) design and optimization tool that enables analog design reuse, the Titan Analog Virtual Prototyper (AVP) layout-aware schematic design tool that performs simultaneous electrical and physical co-design for rapid schematic-to-layout convergence, the Titan Analog Layout Accelerator (ALX) that automates migration of analog cell layouts to new process technologies while preserving design intent, and Titan Shape-Based Router (SBR) that automates difficult routing tasks to deliver a 10X improvement in routing productivity.
The Titan Mixed-Signal Platform and Titan Accelerators are fully compatible with TowerJazz’s 180-nm Power Management design flow.
Tuesday, August 24, 2010
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