Thursday, September 15, 2011

Nanometrics OCD metrology systems selected by Asian foundry

MILPITAS, USA: Nanometrics Inc. announced that an emerging Asian foundry has selected Atlas XP+ optical critical dimension (OCD) metrology systems for process control of advanced logic devices. The Atlas XP+ platform was chosen over competitive solutions after a comprehensive head-to-head evaluation of technical performance on advanced devices. Nanometrics’ global applications and customer support capabilities also played a key role in the decision process.

This selection represents long-term incremental business to Nanometrics, as the systems are to be deployed at multiple fabs worldwide to monitor the production of integrated circuits (ICs) with design features at the 3x and 2x technology nodes.

“As logic manufacturers drive to smaller technology nodes, the combination of new device structures and exotic materials such as 3D structures and high-K metal gates challenge the limits of process control,” said David Doyle, vice president of Nanometrics’ Semiconductor Business Unit. “Nanometrics’ OCD technology is a proven solution to this challenge and has become a key enabler for device yield and lower manufacturing costs.”

“This win further demonstrates the leadership role Nanometrics’ products play in enabling the development and manufacturing of the most advanced and challenging semiconductor devices,” said Dr. Timothy J. Stultz, president and CEO. “We are committed to providing leading-edge technology along with global applications and customer support as we partner with our customers to help them address their business and technology challenges.”

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