MILPITAS, USA: Nanometrics Inc., a leading supplier of advanced metrology systems, announced that its IMPULSE integrated metrology optical critical dimension (OCD) and film analysis system has been selected by a major Korean memory manufacturer for chemical mechanical planarization (CMP) process control.
The decision makes the Nanometrics IMPULSE system “tool-of-record” for CMP control of NAND Flash memory in high-volume manufacturing at the 2x nm node. The IMPULSE was selected over competitive offerings following an extended technical evaluation.
“Today’s demands on CMP process control absolutely require integrated solutions,” said Steve Bradley, director, Integrated Metrology Business Unit. “The selection of the IMPULSE for this leading-edge application is evidence of our product’s high throughput, excellent reliability, extendibility, and seamless integration onto the CMP platform, as well as the customer’s confidence in Nanometrics’ global service and applications support teams.”
“The selection of our integrated metrology product combined with an earlier decision in favor of our fully-automated Atlas OCD platform firmly establishes Nanometrics as the principle supplier of OCD products to this customer for advanced technology process control metrology,” said Dr. Timothy J. Stultz, president and CEO. “By working closely with our customers on product roadmaps and aligning our product development with their requirements, we benefit from long term partnerships while we contribute to their advanced technology development and production ramps.”
Tuesday, September 27, 2011
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