Photoresists likely to show strong growth despite downturn

BOSTON, USA: According to a report released earlier this year by Linx Consulting, the leading international electronic materials consulting firm, 193nm photoresist represents the largest growth opportunity in the advanced patterning market. The report forecasts the market for 193nm photoresist will grow at a CAGR of 27 percent over the next five years.

The report, entitled Advanced Patterning, 2008-2013, examines the global markets for advanced photoresists and photoresist ancillaries, including both spin-on materials as well as vacuum-deposited materials.

The report also quantifies overall supplier shares as well as shares of specific photoresists and ancillary products. Photoresist supplier shares for all products in 2008 are illustrated here.

JSR, TOK and Shin Etsu currently control 78 percent of the 193nm photoresist market. These participants are predicted to continue to enhance their strong position in this segment.

To keep suppliers up-to-date on the most recent developments in this market, Linx Consulting has launched a new service entitled Patterning Materials Forecasting and Market Share Service. It offers forecasts on the market growth of each segment along with market shares in an independent view of the market.

The Patterning Materials Forecasting and Market Share Service is a semi-annual service that provides a market forecast of Novolak and chemically-amplified resists for all common wavelengths and immersion lithography.

Additionally, the service includes forecasts on patterning ancillaries such as ARCs, TARCs, top coats, immersion materials, and multi-level patterning materials. All forecasts include a segmentation of regions and major device types.