Saturday, June 12, 2010

Cadence delivers extensive support for TSMC AMS Reference Flow 1.0 for 28nm process

SAN JOSE, USA: Cadence Design Systems Inc. announced its support for TSMC Analog/Mixed-Signal (AMS) Reference Flow 1.0 for advanced 28-nanometer process technology.

The collaboration between Cadence and TSMC on this new reference flow will help accelerate time to market for advanced mixed-signal designs, help reduce redundant investment in design infrastructure and improve return on investment.

“The collaboration with Cadence is integral to the success of our customers delivering advanced analog/mixed-signal designs,” said Tom Quan, deputy director of design methodology and service marketing at TSMC.

“The TSMC AMS Reference Flow for 28 nanometer represents the industry’s most complete methodology for creating, verifying and producing silicon that takes advantage of the latest process technology. We look forward to continuing our work with Cadence and the entire TSMC Open Innovation Platform ecosystem to ensure that our technologies keep pace with emerging design challenges and maximize our customers’ investment in design infrastructure.”

The reference flow enhancements deliver significant assistance to design teams tasked with achieving efficient and cost-effective Silicon Realization, a key pillar of the Cadence EDA360 strategy.

Cadence mixed-signal technologies provide extremely comprehensive support for TSMC’s new 28-nanometer reference flow, addressing the steps required to get a design into silicon. The collaboration between Cadence and TSMC directly addresses the increasing complexity and integration in analog and mixed-signal functionality in the silicon designs used in wireless, networking, consumer and other applications.

“With the increasing complexity of wireless, networking, consumer and CPU designs, the analog and mixed-signal IP can represent more than 50 percent of a chip design,” said Sandeep Mehndiratta, group director of product management at Cadence. “Cadence’s support of TSMC AMS Reference Flow 1.0 optimized for TSMC silicon technology delivers a comprehensive design, verification and implementation solution to our customers for realizing highest quality advanced mixed-signal designs on 28 nanometers.”

The TSMC reference flow incorporates the broad suite of Cadence technology offerings from the Virtuoso platform, delivering extensive coverage for design, verification and implementation of AMS IP on 28 nanometers.

Based on proven methods for advanced 28-nanometer designs, Cadence technology, in collaboration with TSMC, enables schematic design, AMS verification, RF and transient noise analysis, yield sensitivity analysis, constraints-driven layout, analog placement and routing, physical verification, DFM-aware parasitic extraction, IR drop and electromigration analysis.

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