Nanometrics' multiple system order for Caliper Mosaic overlay metrology systems

MILPITAS, USA: Nanometrics Inc., a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, announced a multiple system order for its Caliper Mosaic overlay metrology system.

The systems will be used in production running in conjunction with the Blossom overlay target technology and are expected to be delivered and qualified in the third quarter of 2009.

The Caliper Mosaic systems were ordered as a follow on to an initial system purchased in 2008 from a leading DRAM manufacturer for high volume lithography process control. The customer will also purchase licenses for the Blossom overlay target technology.

“The Blossom overlay mark, when used in conjunction with our Caliper Mosaic systems enables customers to extend their known metrology technologies while continuing to leverage improvements in precision and throughput,” commented Nigel Smith, Director of Overlay Product Technology at Nanometrics.

“The Blossom technology is gaining traction as an alternative to established target schemes as it enables our customers to measure up to 28 layers at one time. This simultaneous multi-layer measurement capability is especially beneficial in double patterning processes, offering the best possible precision for advanced lithography process control of critical layers, while substantially reducing total target real-estate requirements.”