MINNEAPOLIS, USA: FSI International Inc., a leading manufacturer of surface conditioning equipment for microelectronics manufacturing, announced that it received a repeat ORION single wafer cleaning system order from a leading foundry producer. The order is expected to ship in the fourth quarter of fiscal 2011.
The customer will use the system for back-end-of-line (BEOL) cleaning processes. Foundry and logic manufacturers are finding low-k materials and metal film stacks used for advanced devices are much more sensitive to wet cleaning than previous generations of BEOL processes. The closed chamber technology of the ORION system has demonstrated highly efficient removal of etch and ash by-products without causing galvanic corrosion or changes in metal and dielectric film properties.
FSI International is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. Using the company’s broad portfolio of cleaning products, which include batch and single-wafer platforms for immersion, spray, vapor and cryogenic aerosol technologies, customers are able to achieve their process performance flexibility and productivity goals.
Thursday, July 7, 2011
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