SEMICON West 2013, USA: Through a series of lectures and workshops, SEMATECH will address R&D challenges and closing key infrastructure technology gaps from July 8–12 at SEMICON West in San Francisco, CA.
SEMATECH experts will discuss the challenges which are affecting progress in next-generation lithography techniques, new materials and processes for sub-20 nm manufacturing as well as present a variety of advances in new materials and device structures and lithography.
“In order to prepare for major industry transitions that will stress the industry’s resources over the next decade, we must evolve our infrastructure collaborations to address rapidly evolving technical and business model challenges,” said Dan Armbrust, president and CEO of SEMATECH.
“SEMICON West is an important conference that brings together manufacturers, suppliers, developers, academia and research consortia to share knowledge and discuss how to meet these challenges in order to sustain growth into the future.”
Monday, June 17, 2013
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