Mattson wins follow-on orders for Suprema photoresist strip systems from major foundry

FREMONT, USA: Mattson Technology Inc., a leading supplier of advanced process equipment used to manufacture semiconductors, announced that a major foundry has placed follow-on orders for multiple Suprema photoresist strip systems for expansion of its latest fab.

The Supremas will be used in front-end-of-line (FEOL), mid-of-line (MoL), and back-end-of-line (BEOL) strip applications for high-volume production at the 3X nanometer (nm) technology nodes and advanced device development at the 2X nm nodes. The systems have already begun shipment in the fourth quarter of 2010.

"These follow-on orders validate our customer's confidence in the Suprema's reliability, productivity, and extendibility for volume-production expansion and future node development," said Rene George, VP and GM of Mattson Technology's Plasma Products Group.

"As the process tool of record for this foundry's 32 nm line, Suprema is qualified on all FEOL strip applications -- including bulk, high-dose implant strip (HDIS), low-dose implant strip (LDIS) -- and provides the innovative strip technology required to address the BEOL cleaning challenges associated with advanced process nodes."

"These latest follow-on orders expands Mattson Technology's presence in the foundry segment and reinforces the Suprema system's strip leadership," continued George.

"We will continue to provide our long-time customer with advanced strip systems that deliver the high productivity, low cost of ownership, and technology extendibility it requires for leading-edge device production and next-generation process development."