Advantest announces CD-SEM metrology tool for next-gen photomasks

TOKYO, JAPAN: Advantest Corp. announced the availability of its new SEM-based Critical Dimension (CD) measurement system for next-generation photomasks and patterned media. The E3630 is fully compatible with Advantest’s existing E3610/E3620 CD-SEM measurement systems and software, and boasts 30 percent improved linewidth repeatability.

As semiconductor device features continue to shrink, photomask patterning challenges have created new requirements for highly precise, stable metrology. Advantest’s E3600 series of CD-SEM measurement systems is already in use by multiple leading semiconductor and photomask manufacturers.

The E3630 features a newly developed objective lens and ultra-low-vibration platform, enabling 30 percent higher linewidth repeatability compared to the E3610/E3620. This industry-best performance makes the E3630 ideally suited for measuring the critical dimension (CD) of the miniature-sized patterns on photomasks for EUV (extreme ultraviolet) and nanoimprint lithography.

The tool is optimal for photomask development and manufacturing evaluation at the 22nm and 16nm production nodes.