Wednesday, October 22, 2014

EV Group next-gen nanoimprint lithography technology targets photonics, LED and bio-engineered device production

ST. FLORIAN, AUSTRIA: EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, introduced its SmartNIL™ large-area nanoimprint lithography (NIL) process.

Available on all EV Group NIL platforms, including mask aligners as well as the industry benchmark EVG®720 and newly available EVG®7200 UV-NIL systems, SmartNIL provides a low-cost, large-area and high-volume-manufacturing solution for a variety of advanced devices, including:

* Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics.
* Micro arrays and nano-devices for medical devices and bioengineered applications.
* Advanced storage media, including newly emerging forms of non-volatile memory (NVM).

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