SAN JOSE, USA: Magma Design Automation Inc. announced that Magma's Talus and Quartz IC implementation and physical verification solutions have been included to support the TSMC Reference Flow 11.0.
Through TSMC's Open Innovation Platform (OIP), Magma's product suite provides users with new 28-nanometer (nm) design methodology features to address the challenges of low power, performance and design for manufacturability (DFM).
"Magma has worked very closely with TSMC and a number of key customers targeting 28-nm silicon to address the new design challenges presented at that process technology node," said Premal Buch, general manager of Magma's Design Implementation Business Unit.
"As a result of this collaborative effort, our customers have already begun successfully taping out test chips targeted for TSMC's 28-nm process. The combination of the Talus and Quartz solutions and TSMC's Reference Flow 11.0 provides faster timing closure on large, tough designs without sacrificing performance or increasing power consumption."
"Our collaboration with Magma and several of our mutual customers has resulted in significant improvements in the manufacturability of nanometer designs," said S.T. Juang, senior director of design infrastructure marketing at TSMC. "Magma's Talus and Quartz have been validated for Reference Flow 11.0 to support TSMC's 28-nm process node, which will benefit our mutual leading-edge customers."
28-nm design enablement
Magma's Talus RTL-to-GDSII IC Implementation system supports TSMC 28-nm design rules that have been enhanced in Reference Flow 11.0. Talus' support of Reference Flow 11.0 takes advantage of new power, performance and DFM features, providing customers with faster overall design closure and better performance and predictability.
In addition, Magma's Quartz DRC and Quartz LVS physical verification tools support sign-off and in-the-loop physical verification. Quartz DRC and Quartz LVS are official components of TSMC's 65nm Integrated Sign-Off (ISF) Flow and runsets are available from TSMC Online.
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