New Shanghai HuaLi foundry chooses Mentor Graphics Calibre RET solution for 65/45nm development and production

WILSONVILLE, USA: Mentor Graphics Corp. announced that Shanghai HuaLi Microelectronics Corp., a joint foundry venture of the China Government, Shanghai Alliance Investment Co. Ltd, Shanghai Hua Hong (Group) Co. Shanghai Grace Semiconductor Manufacturing Corp., and Shanghai Hua Hong NEC Electronics Co. Ltd, has chosen the Calibre RET and OPC Computational Lithography platform to support its 65, 55 and 45nm development and production.

The Mentor Calibre nmOPC and Calibre OPCverify products were selected following a comprehensive technical benchmark in which the Calibre solution demonstrated superior accuracy, ease of use, cost of ownership and overall support capability.

“As a new foundry, HuaLi faced a steep learning curve and severe schedule constraints in establishing a production-ready RET and OPC solution," said Ming-Sheng Guo, deputy fab director. “Mentor distinguished itself with a solid commitment to HuaLi for both technology delivery and technical support. Our choice of Mentor as an exclusive partner was based on Mentor’s ability to meet our aggressive technology, schedule, and cost requirements. We believe this partnership is critical in establishing an advanced post-GDSII tapeout flow to compete in today’s foundry market space.”

“Mentor’s strength in the manufacturing space has always been the result of a combination of the most advanced technology and a focus on our customers’ success,” said Joseph Sawicki, vice president and general manager of the Design to Silicon division at Mentor Graphics. “The Calibre OPC/RET/ MDP platform enables HuaLi to have a complete mask data preparation flow with a single source of support for OPC development and production on a unified infrastructure with the most production deployed software in the industry.”